New photoresists for super-resolution photo-inhibition nanofabrication

Direct laser writing based on photoinhibited polymerization has met great challenges to produce three-dimensional structures of nano-scale feature size due to the properties of photoresist. We developed a photoresist of high photosensitivity to improve the fabrication resolution and introduced a two-photon photoinitiator into the photoresist to implement photoinhibited polymerization in two-photon fabrication. Consequently, we realised dots of 40 nm in diameter and lines of 130 nm in width through single-photon polymerization and achieved effective photoinhibited polymerisation in the two-photon process.