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In situ micro-Raman analysis and X-ray diffraction of nickel silicide thin films on silicon

journal contribution
posted on 2024-11-01, 06:03 authored by Madhu BhaskaranMadhu Bhaskaran, Sharath SriramSharath Sriram, Tatiana Perova, V Ermakov, G Thorogood, K.T. Short, Anthony HollandAnthony Holland
This article reports on the in situ analysis of nickel silicide (NiSi) thin films formed by thermal processing of nickel thin films deposited on silicon substrates. The in situ techniques employed for this study include micro-Raman spectroscopy (μRS) an

History

Related Materials

  1. 1.
    DOI - Is published in 10.1016/j.micron.2008.03.007
  2. 2.
    ISSN - Is published in 09684328

Journal

Micron

Volume

40

Issue

1

Start page

89

End page

93

Total pages

5

Publisher

Pergamon-Elsevier Science

Place published

Oxford

Language

English

Copyright

© 2008 Elsevier Ltd. All rights reserved.

Former Identifier

2006011841

Esploro creation date

2020-06-22

Fedora creation date

2009-11-18

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    Categories

    Keywords

    In situ measurementsXRDmicro-Raman spectroscopynickel silicide

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    All rights reserved

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