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Spin accumulation in disordered topological insulator ultrathin films

journal contribution
posted on 2024-11-02, 12:22 authored by Zhuo Siu, Cong Son Ho, Seng Tan, Mansoor Jalil
Topological insulator (TI) ultrathin films differ from the more commonly studied semi-infinite bulk TIs in that the former possess both top and bottom surfaces where the surface states localized at different surfaces can couple to one another across the finite thickness of the film. In the presence of an in-plane magnetization, the TI thin films display two distinct phases depending on which of the inter-surface coupling or the magnetization is stronger. In this work, we consider a Bi2Se3 TI thin film system with an in-plane magnetization and numerically calculate the resulting spin accumulation on both surfaces of the film due to an in-plane electric field to linear order. We describe a numerical scheme for performing the Kubo formula calculation in which we include impurity scattering and vertex corrections. We find that the sums of the spin accumulation over the two surfaces in the in-plane direction perpendicular to the magnetization and in the out of plane direction are antisymmetric in Fermi energy around the charge neutrality point and are non-vanishing only when the symmetry between the top and bottom TI surfaces is broken. The impurity scattering, in general, diminishes the magnitude of the spin accumulation.

History

Related Materials

  1. 1.
    DOI - Is published in 10.1063/1.4985846
  2. 2.
    ISSN - Is published in 00218979

Journal

Journal of Applied Physics

Volume

122

Number

073903

Issue

7

Start page

1

End page

11

Total pages

11

Publisher

American Institute of Physics

Place published

United States

Language

English

Copyright

© 2017 Author(s).

Former Identifier

2006097645

Esploro creation date

2020-06-22

Fedora creation date

2020-04-21

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