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Wide band gap and conducting tungsten carbide (WC) thin films prepared by hot wire chemical vapor deposition (HW-CVD) method

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posted on 2024-11-02, 02:01 authored by Amit Pawbake, Ravindra Waykar, Ashok Jadhavar, Rupali Kulkarni, Vaishali Waman, Abhijit Shridhar DateAbhijit Shridhar Date, Dattatray Late, Habib Pathan, Sandesh Jadkar
In this letter, we report synthesis of tungsten carbide (WC) thin films having wide band gap(3.22-3.3 eV) with high electrical conductivity (80-1260 S/cm) by HW-CVD using heated using heated W filament and Tetra-fluoro-methane (CF4) gas. Formation of WC was confirmed by low angle XRD, Raman spectroscopy and x-ray photoelectron spectroscopy. UV-Visible spectroscopy analysis revealed that the synthesized films have high transmission at wavelength 500 nm. Electrical properties measured using Hall measurement show that these films are semiconductor. The obtained results imply that the growth of WC thin films is mainly from the atomic species(W and C) evaporated from the hot filament. The HW-CVD opens a novel route to synthesize wide band gap and conducting WC at a cost-efficient way for DSSCs and hydrogen evolution reaction (HER).

History

Journal

Materials Letters

Volume

183

Start page

315

End page

317

Total pages

3

Publisher

Elsevier

Place published

Netherlands

Language

English

Copyright

© 2016 Elsevier

Former Identifier

2006067251

Esploro creation date

2020-06-22

Fedora creation date

2019-03-26

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